Influence of driving frequency on narrow-gap reactive-ion etching in SF6

Journal of Physics D: Applied Physics

Volumn 28, Issue 1, 1995, Pages 31-39

  Nakano, Nobuhiko ^a   Makabe, Toshiaki ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002458866     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/28/1/007     Document Type: Article

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