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Catalysis Letters

Volumn 51, Issue 1, 1998, Pages 53-58

Chemical vapor deposition of gold on Al2O3, SiO2, and TiO2 for the oxidation of CO and of H2

(6) Okumura, Mitsutaka a Nakamura, Shyunichi b Tsubota, Susumu a Nakamura, Toshiko a Azuma, Masashi b Haruta, Masatake a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b OSAKA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Chemical vapor deposition; CO oxidation; Gold catalysts; Hydrogen oxidation

Indexed keywords

EID: 0002287407 PISSN: 1011372X EISSN: None Source Type: Journal
DOI: 10.1023/a:1019020614336 Document Type: Article

Times cited : (508)

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