Image quality enhancements for raster scan lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 922, Issue , 1988, Pages 55-64

  Rieger, Michael L ^a   Schoeffel, James A ^a   Warkentin, Paul A ^a  

^a ATEQ Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; IMAGE QUALITY; MASKS; PIXELS; QUALITY CONTROL; RANDOM ERRORS; RASTERIZATION; SYSTEMATIC ERRORS;

EXPOSURE CHARACTERISTICS; HIGH RESOLUTION IMAGE; IMAGE QUALITY ENHANCEMENTS; LITHOGRAPHY SYSTEMS; MINIMUM FEATURE SIZES; QUALITY ENHANCEMENT; RELATIVE INTENSITY; THEORETICAL FOUNDATIONS;

IMAGE ENHANCEMENT;

EID: 0002086374     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.968402     Document Type: Conference Paper

References (6)

1. C. Mack, Photoresist Process Optimization, National Security Agency, Fort Meade, MD.
2. J. D. Foley, A. Van Dam, Fundamentals of Interactive Computer Graphics, ch. 11, Addison-Wesley, Menlo Park, CA (1982).
3. E. Catmull, "A Hidden Surface Algorithm with Anti-Aliasing," Computer Graphics, 12(13) August (1978).
4. C.-C. Fu, D. H. Dameron, A. McCarthy, "Elimination of mask-induced defects with vote-Taking lithography," SPIE Vol. 633, Optical Lithography V, 270-277 (1986).
5. P. A. Warkentin, J. A. Schoeffel, "Scanning laser technology applied to high speed reticle writing," SPIE Vol. 633, Optical Lithography V, 286-290 (1986).
6. G. A. Burns, J. A. Schoeffel, "Performance Evaluation of the ATEQ CORE-2000 Scanning Laser Reticle Writer," SPIE Vol. 772, Optical Lithography VI, 772-734 (1987).