Rapid thermal oxidation of GeSi strained layers

Applied Physics Letters

Volumn 56, Issue 1, 1990, Pages 66-68

  Nayak, D ^a   Kamjoo, K ^a   Woo, J C S ^a   Park, J S ^a   Wang, K L ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

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Indexed keywords

EID: 0001946668     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.102653     Document Type: Article

References (21)