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Volumn 14, Issue 2, 1993, Pages 69-71

Extension of Impact-Ionization Multiplication Coefficient Measurements to High Electric Fields in Advanced Si BJT’s

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EID: 0001839302     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.215111     Document Type: Article
Times cited : (34)

References (10)
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    • Lu, P.-F.1    Chen, T.-C.2
  • 2
    • 0026203454 scopus 로고
    • Characteristics of impact-ionization current in the advanced self-aligned polysilicon-emitter bipolar transistor
    • T. M. Liu, T.-Y. Chiu, V. D. Archer, and H. H. Kim, “Characteristics of impact-ionization current in the advanced self-aligned polysilicon-emitter bipolar transistor,” IEEE Trans. Electron Devices, vol. 38, no. 8, pp. 1845–1851, 1991.
    • (1991) IEEE Trans. Electron Devices , vol.38 , Issue.8 , pp. 1845-1851
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  • 3
    • 0026239123 scopus 로고
    • Measurements of avalanche effects and light emission in advanced Si and SiGe bipolar transistors
    • E. Zanoni, S. Bigliardi, P. Pavan, P. Pisoni, and C. Canali, “Measurements of avalanche effects and light emission in advanced Si and SiGe bipolar transistors,” Microelectron. Eng., vol. 15, pp. 23–26, 1991.
    • (1991) Microelectron. Eng. , vol.15 , pp. 23-26
    • Zanoni, E.1    Bigliardi, S.2    Pavan, P.3    Pisoni, P.4    Canali, C.5
  • 4
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    • The impact of non-equilibrium transport on breakdown and transit time in bipolar transistors
    • E. F. Crabbé, J. M. C. Stork, G. Baccarani, M. V. Fischetti, and S. E. Laux, “The impact of non-equilibrium transport on breakdown and transit time in bipolar transistors,” in IEDM Tech. Dig., 1990, pp. 463–466.
    • (1990) IEDM Tech. Dig. , pp. 463-466
    • Crabbé, E.F.1    Stork, J.M.C.2    Baccarani, G.3    Fischetti, M.V.4    Laux, S.E.5
  • 5
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    • 63-75 GHz fTSiGe-base heterojunction bipolar technology
    • G. L. Patton et al., “63-75 GHz f T SiGe-base heterojunction bipolar technology,” in Proc. VLSI Symp., 1990, pp. 49–50.
    • (1990) Proc. VLSI Symp. , pp. 49-50
    • Patton, G.L.1
  • 6
    • 0015346596 scopus 로고
    • Der Einfluss des Basisbah-nwiderstandes und der Landungstragermultiplication auf das Aus-gangskennlinienfeld von Planartransistoren
    • H. M. Rein, T. Schad, and R. Zühlke, “Der Einfluss des Basisbah-nwiderstandes und der Landungstragermultiplication auf das Aus-gangskennlinienfeld von Planartransistoren,” Solid-State Electron., vol. 15, pp. 481–500, 1972.
    • (1972) Solid-State Electron. , vol.15 , pp. 481-500
    • Rein, H.M.1    Schad, T.2    Zühlke, R.3
  • 8
    • 84954108170 scopus 로고
    • Non local impact ionization in silicon devices
    • J. W. Slotboom et al., “Non local impact ionization in silicon devices,” in IEDM Tech. Dig., 1991, pp. 127–130.
    • (1991) IEDM Tech. Dig. , pp. 127-130
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  • 9
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    • Coupled-Langevin-equation analysis of hot-carrier transport in semiconductors
    • T. Kuhn, L. Reggiani, and L. Varani, “Coupled-Langevin-equation analysis of hot-carrier transport in semiconductors,” Physical Rev. B, vol. 45, no. 4, pp. 1903–1906, 1992.
    • (1992) Physical Rev. B , vol.45 , Issue.4 , pp. 1903-1906
    • Kuhn, T.1    Reggiani, L.2    Varani, L.3
  • 10
    • 84907835545 scopus 로고
    • Numerical analysis of breakdown in silicon diodes
    • W. Guade and M. Rudan, “Numerical analysis of breakdown in silicon diodes,” in Proc. ESSDERC, 1989, pp. 97–100.
    • (1989) Proc. ESSDERC , pp. 97-100
    • Guade, W.1    Rudan, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.