Preliminary study of [Ni(en)3] (CF3CO2)2 and Ni(en) (hfpd)2 as precursors for metalorganic chemical vapour deposition: Structural properties and thermal behaviours (en = ethylenediamine, hfpd = hexafluoropentadionato( - ))

Inorganica Chimica Acta

Volumn 248, Issue 1, 1996, Pages 15-21

  Urrutigoïty, Martine ^a   Cecutti, Christine ^a   Senocq, François ^a   Gorrichon, Jean Pierre ^a   Gleizes, Alain ^a  

^a CNRS   (France)

Author keywords

Crystal structures; MOCVD; Nickel complexes; Thermal analysis

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTAL STRUCTURE; GAMMA RAYS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SINGLE CRYSTALS; THERMOANALYSIS;

CHEMICAL VAPOUR DEPOSITION; METAL-ORGANIC CHEMICAL VAPOUR DEPOSITIONS; NEUTRAL COMPLEXES; NICKEL COMPLEX; SINGLE CRYSTAL X-RAY DIFFRACTION; SUBSTRATE TEMPERATURE; THERMAL BEHAVIOURS; THERMAL GRAVIMETRIC ANALYSIS;

NICKEL COMPOUNDS;

EID: 0001808693     PISSN: 00201693     EISSN: None     Source Type: Journal    
DOI: 10.1016/0020-1693(95)04978-9     Document Type: Article

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