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Volumn 48, Issue 15, 1993, Pages 10815-10827

Improved defect-pool model for charged defects in amorphous silicon

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Indexed keywords


EID: 0001761379     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.48.10815     Document Type: Article
Times cited : (263)

References (56)
  • 24
    • 84927357593 scopus 로고    scopus 로고
    • in Amorphous Silicon Technology—1990, edited by P. C. Taylor, M. J. Thompson, P. G. LeComber, Y. Hamakawa, and A. Madan, MRS Symposia Proceedings No. 192 (Materials Research Society, Pittsburgh, 1990), p. 261.
  • 26
    • 84927357592 scopus 로고    scopus 로고
    • See, for example, C. Kittel, Thermal Physics (Wiley, New York, 1969), p. 143.
  • 28
    • 84927357591 scopus 로고    scopus 로고
    • Thermal Physics (Ref. 25), p. 118.
  • 29
    • 84927357590 scopus 로고    scopus 로고
    • The integral in Eq. (14) can be solved exactly, with the result that the factor 2Ev02/ [ 2 Ev0- kT ] in Eqs. (15) and (18) is replaced by π kT / lcurl 2 sin ( π k T / [ 2 Ev0]) rcurl. This leads to a correction in the total density of states of about 12%, which is less than the experimental uncertainty in input parameters, e.g., Nv0 and H, which have the same effect.
  • 55
    • 84927357587 scopus 로고    scopus 로고
    • M. Stutzmann (private communication); see also M. Brandt, A. Asano, and M. Stutzmann in Amorphous Silicon Technology-1993, MRS Symposia Proceedings No. 297 (Materials Research Society, Pittsburgh, in press).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.