Thermal cycling and stress relaxation response of Si-Al and Si-Al-SiO2 layered thin films

Acta Metallurgica Et Materialia

Volumn 43, Issue 11, 1995, Pages 3915-3926

  Shen, Y L ^a   Suresh, S ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001697854     PISSN: 09567151     EISSN: None     Source Type: Journal    
DOI: 10.1016/0956-7151(95)00099-H     Document Type: Article

References (27)

1. Plastic properties of thin films on substrates as measured by submicron indentation hardness and substrate curvature techniques
2. Measurement and Interpretation of stress in aluminum-based metallization as a function of thermal history
3. Thin Films Stresses and Mechanical Properties
4. Thin Films: Stresses and Mechanical Properties IV
5. The Tension of Metallic Films Deposited by Electrolysis
6. Thin Films: Stresses and Mechanical Properties IV
7. Thin Films: Stresses and Mechanical Properties IV