UV laser-induced photolysis of silacyclopent-3-ene: Unseparable photochemistry of reactant and product for chemical vapour deposition of Si/C/H polymer

Journal of Organometallic Chemistry

Volumn 575, Issue 2, 1999, Pages 246-250

  Pola, Josef ^a   Ouchi, Akihiko ^b   Urbanová, Markéta ^a   Koga, Yoshinori ^a   Bastl, Zdenek ^c   Šubrt, Jan ^d  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b NATL INST OF MAT AND CHEM RES   (Japan)

^c J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^d INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

Chemical vapour deposition; Laser induced photolysis; Si C H polymer; Silacyclopent 3 ene; Silylene

Indexed keywords

EID: 0001670064     PISSN: 0022328X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-328X(98)01001-8     Document Type: Article

References (40)

1. Chernyshev E.A., Kovalenkova N.G., Bashkirova S.A. J. Organomet. Chem. 271:1984;129.
2. Lei D., Gaspar P.P. Organometallics. 4:1985;1471.
3. Steinmetz M.G., Yu C. Organometallics. 11:1992;2686.
4. Rogers D.S., O'Neal H.E., Ring M.A. Organometallics. 5:1986;1467.
5. P.P. Gaspar, in: H. Sakurai (Ed.), Organosilicon and Bioorganosilicon Chemistry, E. Horwood, Chichester, 1985, p. 88.
6. I.M.T. Davidson, in: E.R. Corey, J.Y. Corey, P.P. Gaspar (Eds.), Silicon Chemistry, E. Horwood, Chichester, 1988, p. 173.
7. J.M. Jasinski, R. Becerra, R. Walsh, Chem. Rev. 95 (1995) 1203 and references therein.
8. O'Brien J.J., Atkinson G.H. J. Phys. Chem. 92:1988;5782.
9. R. Becerra, R. Walsh, J. Phys. Chem. 96 (1992) 10 856 and references therein.
10. Martin J.G., Ring M.A., O'Neal H.E. Int. J. Chem. Kinet. 19:1987;715.
11. Martin J.G., O'Neal H.E., Ring M.A. Int. J. Chem. Kinet. 22:1990;613.
12. Rickborn S.F., Ring M.A., O'Neal H.E., Coffey D. Int. J. Chem. Kinet. 16:1984;289.
13. Rogers D.S., Ring M.A., O'Neal H.E. Organometallics. 5:1986;1521.
14. Nedorfl P.S., Lown E.M., Safarik I., Jodhan A., Strausz O.P. J. Am. Chem. Soc. 109:1987;5780.
15. Francisco J.S., Joyce S.A., Steinfeld J.I., Walsh F. J. Phys. Chem. 88:1984;3098.
16. Safarik I., Sandhu V., Lown E.M., Strausz O.P., Bell T.N. Res. Chem. Intermed. 14:1990;105.
17. M.A. Ring, H.E. O'Neal, J. Phys. Chem. 96 (1992) 10 848 and references therein.
18. Jasinski J.M., Gates S.M. Acc. Chem. Res. 24:1991;9.
19. Metzger D., Hesch K., Hess P. Appl. Phys. A. 45:1988;345.
20. Kumata K., Itoh U., Toyoshima Y., Tanaka N., Anzai H., Matsuda A. Appl. Phys. Lett. 48:1986;1380.
21. Yoshida A., Ikeda S., Tsuchimoto H. J. Non-Cryst. Solids. 164-166:1993;95.
22. Brodsky M.H., Cardona M., Cuomo J.J. Phys. Rev. B. 16:1977;3556.
23. Maley N., Myers A., Pinarbasi M., Leet D., Abelson J.R., Thornton J.A. J. Vac. Sci. Technol. A. 7:1989;1267.
24. Brodsky M.H., Frisch M.A., Ziegler J.F., Lanford W.A. Appl. Phys. Lett. 30:1977;561.
25. Wakisaka K., Kameda M., Matsuyama T., Tanaka M., Haku H., Tarui H., Nakamura N., Kouzuma S., Nishiwaki H., Tsuda S., Nakano S., Kuwano Y. Optoelectronics. 7:1992;143.
26. Perkins G.G.A., Austin E.R., Lampe F.W. J. Am. Chem. Soc. 101:1979;1109.
27. Perkins G.G.A., Lampe F.W. J. Am. Chem. Soc. 102:1980;3764.
28. Damrauer R., Simon R., Laporterie A., Manuel G., Park Y.T., Weber W.P. J. Organomet. Chem. 391:1990;7.
29. Čukanová D., Pola J. J. Organomet. Chem. 453:1993;17.
30. Urbanová M., Volnina E.A., Guselnikov L.E., Bastl Z., Pola J. J. Organomet. Chem. 509:1996;73.
31. Doepker R.D. J. Phys. Chem. 72:1968;4037.
32. R. Srinivasan, Adv. Photochem. 4 (1966) 113 and references therein.
33. Collin G.J., Deslauriers H., De Mare G.R., Poirier R.A. J. Phys. Chem. 94:1990;134.
34. Haller I., Srinivasan R. J. Phys. Chem. 40:1964;1992.
35. Bhusari D.M., Kshirsagar S.T. Mater. Lett. 11:1991;348.
36. H.C. Low, P. John, J. Organomet. Chem. 201 (1980) 363 and references therein.
37. NIST X-ray Photoelectron Spectroscopy Database, US Department of Commerce, NIST, Gaitersburg, 1997.
38. Urbanová M., Morita H., Dřinek V., Bastl Z., Šubrt J., Pola J. J. Anal. Appl. Pyrol. 44:1998;219.
39. J. Pola, Surf. Coat. Technol. 100-101 (1998) 408 and references therein.
40. J. Pola, Res. Chem. Intermed. (in press).