Improved step edges on LaAlO3 substrates by using amorphous carbon etch masks

Applied Physics Letters

Volumn 65, Issue 9, 1994, Pages 1177-1179

  Yi, H R ^a   Ivanov, Z G ^a   Winkler, D ^a   Zhang, Y M ^a   Olin, H ^a   Larsson, P ^a   Claeson, T ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

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EID: 0001670005     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.112138     Document Type: Article

References (8)