Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4mixtures

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 75, Issue 4, 1997, Pages 485-496

  Liu, Yichun ^a,b,c,d   Giorgis, F ^a   Pirri, C F ^a  

^a NORTHEAST NORMAL UNIVERSITY   (China)

^b CHANGCHUN INSTITUTE OF OPTICS   (China)

^c POLITECNICO DI TORINO   (Italy)

^d KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001657481     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/13642819708202333     Document Type: Article

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