Properties of Si1-xGex three-dimensional islands

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 2345-2350

  Sullivan, J S ^a   Mateeva, E ^a   Evans, H ^a   Savage, D E ^a   Lagally, M G ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY COMPOSITIONS; CLASSICAL MODEL; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DISLOCATION-FREE; ISLAND SHAPE; LINEAR ELASTIC MODEL; MOLE FRACTION; NUCLEATION AND GROWTH; NUMBER DENSITY; SI(0 0 1); SI(001) SURFACES; STRAINED FILMS; STRANSKI-KRASTANOV GROWTH MODE; SUBSTRATE TEMPERATURE; TEMPERATURE DEPENDENCE; THREE-DIMENSIONAL (3D) ISLANDS; THREE-DIMENSIONAL ISLANDS; WETTING LAYER;

ACTIVATION ENERGY; ALLOYING; ALLOYS; GERMANIUM; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

THREE DIMENSIONAL;

EID: 0001652375     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581771     Document Type: Conference Paper

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