Reactive atom-surface scattering: The adsorption and reaction of atomic oxygen on the Si(100) surface

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 7, Issue 3, 1989, Pages 1837-1840

  Engstrom, J R ^a   Nelson, Mark M ^a   Engel, Thomas ^a  

^a UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001620462     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576011     Document Type: Article

References (10)

1. J. R. Engstrom, M M. Nelson, and T. Engel (to be published).
2. M. P. D’Evelyn, M. M. Nelson, and T. Engel, Surf. Sci. 186 75 (1987).
3. S. J. Sibener, R. J. Buss, C. Y. Ng, and Y. T. Lee, Rev.Sci. Instrum. 51, 167 (1980).
4. R.J. Buss, P. Casavecchia, T. Hirooka, S. J. Sibener, and Y T. Lee, Chem. Phys. Lett. 83, 386 (1981).
5. D. A. King and M. G. Wells, Surf. Sci. 29, 454 (1971); see also C. T. Rettner, L. A. Delouise, and D. J. Auerbach, J. Chem. Phys. 85, 1131 (1986).
6. R. E. Walkup and S. I. Raider, Appl. Phys. Lett. 53, 888 (1988).
7. M. L. Yu and B. N. Eldridge, Phys. Rev. Lett. 58, 1691 (1987).
8. A. J. Schell-Sorokin and J. E. Demuth, Surf. Sci. 157, 273 (1985).
9. G. Hollinger, J. F. Morar, F. J. Himpsel, G. Hughes, and J. L. Jordan, Surf. Sci. 168, 609 (1986).
10. ‘L. Incoccia, A. Balerna, S. Gramm, C. Kunz, F. Senf, and I. Storjohann, Surf. Sci. 189/190.453 (1987).