Magnetron reactive ion etching of group III-nitride ternary alloys

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1046-1049

  McLane, G F ^a   Monahan, T ^a   Eckart, D W ^a   Pearton, S J ^b   Abernathy, C R ^b  

^a U S ARMY RESEARCH LABORATORY   (United States)

^b University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001613730     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580131     Document Type: Article

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