Linnik microscope imaging of integrated circuit structures

Applied Optics

Volumn 35, Issue 1, 1996, Pages 131-148

  Gale, D M ^a,b   Pether, M I ^a   Dainty, J C ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

Author keywords

Integrated circuit metrology; Interference microscopy; Profilometry; Waveguide imaging theory

Indexed keywords

EID: 0001606237     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.000131     Document Type: Article

References (13)

1. W. M. Bullis and D. Nyyssonen, “Optical linewidth measurements on photomasks and wafers,” in VLSI Electronics: Microstructure Science, G. Einspruch, ed. (Academic, New York, 1982), Vol. 3, pp. 301-346.
2. D. Nyyssonen, “Calibration of optical systems for linewidth measurements on wafers,” Opt. Eng. 21, 882-887 (1982).
3. M. J. Downs and N. P. Turner, “Application of optical microscopy to dimensional measurements in microelectronics,” in Microscopy: Techniques and Capabilities, L. R. Baker, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 368, 82-87 (1982).
4. D. Nyyssonen, “Theory of optical edge detection and imaging of thick layers,” J. Opt. Soc. Am. 72, 1425-1436 (1982).
5. D. Nyyssonen and C. P. Kirk, “Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory,” J. Opt. Soc. Am. A5, 1270-1280 (1988).
6. C. M. Yuan and A. J. Strojwas, “Modeling optical microscope images of integrated-circuit structures,” J. Opt. Soc. Am. A 8, 778-790 (1991).
7. T. Wilson and C. Shepard, Theory and Practice of Scanning Optical Microscopy (Academic, London, 1984), Chaps. 1 and 3. Objective lenses were NPL achromats purchased as matched pairs from E. Leitz Ltd., London.
8. D. M. Gale, M. I. Pether, and F. C. Reavell, “Interference microscopy of surface relief structures,” in Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, H. L. Stover and S. Wittekoek, eds., Proc. Soc. Photo-Opt. Instrum. Eng. 811, 40-47 (1987).
9. P. Hariharan, “Quasi heterodyne hologram interferometry,” Opt. Eng. 24, 632-638 (1985).
10. P. Carre, “Installation et utilisation du comparateur photoélectrique et interferentiel du Bureau International des Poids et Mesures,” Metrologia 2, 13 (1966).
11. K. Creath, “Calibration of numerical aperture effects in interferometric microscope objectives,” Appl. Opt. 28, 3333-3338 (1989).
12. H. Stahl and J. Tome, “Phase-measuring interferometry: performance characterization and calibration,” in Optical Testing and Metrology II, C. Grover, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 954, 78-87 (1988).
13. M. I. Pether, “Numerical modelling of image formation in the optical microscope,” presented at the First Institute of Physics Conference on Applied Optics and Opto-Electronics, Nottingham, England, 17-20 September 1990; in Applied Optics Digest, J. C. Dainty, ed. (IOP Publishing, Bristol, U.K., 1990), pp. 191-192. Further work to be published.