Volatile Amidoalane Compounds for Chemical Vapor Deposition of Aluminum

Chemistry of Materials

Volumn 10, Issue 9, 1998, Pages 2323-2325

  Choi, Hyungsoo ^a   Hwang, Soontaik ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001589489     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9803354     Document Type: Article

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