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Applied Physics Letters

Volumn 54, Issue 12, 1989, Pages 1127-1129

Dielectric characteristics of fluorinated ultradry SiO2

(6) Nishioka, Yasushiro a Ohji, Yuzuru a Mukai, Kiichiro a Sugano, Takuo b Wang, Yu c Ma, T P c

a HITACHI LTD (Japan)

b UNIVERSITY OF TOKYO (Japan)

c YALE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001581583 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.101479 Document Type: Article

Times cited : (53)

References (7)

1
- 0024478920
- (1989) IEEE Electron Device Lett , vol.EDL-10 , pp. 27
- Haruta, R.¹ Ohji, Y.² Nishioka, Y.³ Mukai, K.⁴ Sugano, T.⁵

2
- 0023534149
- (1987) IEEE Trans. Nucl. Sci , vol.NS-34 , pp. 1190
- da Silva, E.F.¹ Nishioka, Y.² Ma, T.P.³

3
- 0023857569
- (1988) IEEE Electron Device Lett , vol.9 , pp. 38
- Nishioka, Y.¹ da Silva, F.F.² Wang, Y.³ Ma, T.P.⁴

4
- 0038766038
- (1988) Appl. Phys. Lett , vol.52 , pp. 573
- Wang, Y.¹ Nishioka, Y.² Ma, T.P.³ Barker, R.C.⁴

5
- 0001451172
- (1986) J. Appl. Phys , vol.60 , pp. 3232
- Weinberger, B.R.¹ Peterson, G.G.² Eschrieh, T.C.³ Krasinski, H.A.⁴

6
- 0000410102
- (1986) Appl. Phys. Lett , vol.48 , pp. 1208
- Hook, T.B.¹ Ma, T.P.²

7
- 0001514594
- (1974) Appl. Phys. Lett , vol.25 , pp. 685
- DiStefano, T.H.¹ Shatzkes, M.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.