Thickness measurements for ultrathin-film insulator metal-oxide-semiconductor structures using Fowler-Nordheim tunneling current oscillations

Journal of Applied Physics

Volumn 88, Issue 11, 2000, Pages 6560-6563

  Mao, Lingfeng ^a   Tan, Changhua ^a   Xu, Mingzhen ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001566842     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1321781     Document Type: Article

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