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Journal of Physical Chemistry A

Volumn 103, Issue 33, 1999, Pages 6638-6649

Conformations and Barriers of Haloethyl Radicals (CH2XCH2, X = F, Cl, Br, I): Ab Initio Studies

(3) Ihee, Hyotcherl a Zewail, Ahmed H a Goddard III, William A b

a CALIFORNIA INSTITUTE OF TECHNOLOGY (United States)

b CALIFORNIA INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001564030 PISSN: 10895639 EISSN: None Source Type: Journal
DOI: 10.1021/jp990867n Document Type: Article

Times cited : (44)

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