Study of advanced 193nm resists : Material properties and lithographic performance

Journal of Photopolymer Science and Technology

Volumn 12, Issue 3, 1999, Pages 515-524

  Mortini, Bene ^a,b   Gally, Severine ^a   Sassoulas, Pierre Olivier ^a   Prola, Alain ^a   Paniez, Patrick J ^a  

^a STMICROELECTRONICS   (France)

^b ORANGE LABS   (France)

Author keywords

193nm single layer resists; Alicyclic based resist; Chemical amplification; Diffusion contrast; Methacrylate based resist

Indexed keywords

EID: 0001531610     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.515     Document Type: Article

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