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Volumn 5, Issue 3, 1995, Pages 237-246

The incorporation of transition metals into polyhedral oligosilsesquioxane polymers

Author keywords

Inorganic polymer; metalcontaining polymers; polyhedral oligosilsesquioxane

Indexed keywords

EID: 0001527171 PISSN: 10530495 EISSN: 15741451 Source Type: Journal
DOI: 10.1007/BF01057895 Document Type: Article

Times cited : (88)

References (17)

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- For example, by the end of 1994 there were over 170 patents applied for and granted to inventions related to the synthesis and use of silsesquioxane polymers. A sampling of patents are S.-I. Fukuyama. Y. Yoneda, M. Miyagawa, and K. Nishii, Eur. Pat. Appl. EP 163 583 A3 (1985) pattern-forming resist material: H. Sugiyama, K. Nate, T. Inoue, and A. Mizushima, U.S. Pat. 4.745.169 (1988) alkali soluble photoresist: B. G. Bagley. C. R. Kurkjian, and W. E. Quinn, U.S. Pat. 4.835.057 (1989) fiber optic coating: T. Morimoto and H. Yoshioka, U.S. Pat. 5,039,771 (1991) efficient preparative method; P. K. Pawar and F. J. Traver, Eur. Pat. Appl. EP 470 442 A2 (1991) a glass coating material; H. G. Linde and R. A. Previti-Kelly, U.S. Pat. 5.043.789 (1991) insulating material: I. Ono and H. Yoshioka, U.S. Pat 5,319,049 (1994) fungicide material; M. F. Sojka, U.S. Pat. 5,356,616 (1994) nail lacquer formulation.

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