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Physical Review B

Volumn 45, Issue 3, 1992, Pages 1409-1413

Electromigration in stressed thin films

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001512408 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.45.1409 Document Type: Article

Times cited : (138)

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