Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 686-691

  Hedlund, C ^a   Jonsson, L B ^a   Katardjiev, I V ^a   Berg, S ^a   Blom, H O ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001502419     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580802     Document Type: Article

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