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Volumn 85, Issue 8 II A, 1999, Pages 4809-4811

Anisotropy induced by the bowed-substrate sputtering technique in positive/negative magnetostriction FeB/CoSiB bilayers

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EID: 0001501710     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370489     Document Type: Article
Times cited : (17)

References (5)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.