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Volumn 54, Issue 1, 1996, Pages 938-945

Transport of ions during ion implantation

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001498690     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.54.938     Document Type: Article
Times cited : (10)

References (15)
  • 3
    • 85035216658 scopus 로고    scopus 로고
    • J. Albers, Natl. Bur. Stand. (U.S.) Monograph 400-79 (U.S. GPO, Washingtion, DC, 1987)
    • J. Albers, Results of the Monte Carlo Calculation of One- and Two-dimensional Distributions of Particles and Damage: Ion Implanted Dopants in Silicon, Natl. Bur. Stand. (U.S.) Monograph 400-79 (U.S. GPO, Washingtion, DC, 1987).
  • 7
    • 85035201588 scopus 로고    scopus 로고
    • J. F. Ziegler, U. Littmark, and J. P. Biersack, (Pergamon, Oxford, 1985), 1
    • J. F. Ziegler, U. Littmark, and J. P. Biersack, The Stopping and Range of Ions in Solids (Pergamon, Oxford, 1985), Vol. 1.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.