Design Principles of an Optimized Focused Ion Beam System

Advances in Electronics and Electron Physics

Volumn 81, Issue C, 1991, Pages 177-209

  Wang, Y L ^a,c   Shao, Zhifeng ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF VIRGINIA   (United States)

^c INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001498593     PISSN: 00652539     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S0065-2539(08)60865-3     Document Type: Article

References (49)

1. Aihara, R., Sawaragi, H., Thompson, B., Shearer, N.J., Nucl. Instrum. Meth B (1989), 37–38 212.
2. Clear, J.R.A., Ahmed, H., J. Vac. Sci. Technol., B6, 1981, 1035.
3. Crewe, A.V., Ultramicroscopy, 23, 1987, 159.
4. Crewe, A.V., Parker, N.W., Optik, 46, 1976, 183.
5. Gamo, K., Takakura, N., Samoto, N., Shimizu, R., Namba, S., Jpn. J. Appl. Phys., 23, 1984, L293.
6. Glatzel, U., Lenz, F., Optik, 79, 1988, 15.
7. Harriott, H.L., Vasile, M.J., J. Vac. Sci. Technol., B6, 1988, 1035.
8. Harriott, L.R., Wagner, A., Fritz, F., J. Vac. Sci. Technol., 84, 1986, 181.
9. Hart, K.J., J. Vac. Sci. Technol., 10, 1973, 1098.
10. Kurihara, K., J. Appl. Phys. (Japan), 24, 1985, 225.
11. Kurihara, K., J. Vac. Sci. Technol., B3, 1985, 41.
12. Levi-Setti, R., Advances in Electronics and Electron Physics., 13A, 1977, Academic Press, New York (Septier), Suppl p. 261.
13. R. Levi-Setti, [1984], AFOSR/AFSC Final Technical Report, DTIC Document AD-A149–992.
14. Levi-Setti, R., Fox, T.R., Nucl. lnstrum. Meth., 168, 1980, 139.
15. Levi-Setti, R., Wang, Y.L., Crow, G., J. Phys. [Paris] 45 (1984), C5–C9.
16. Liebel, H., Vacuum, 33, 1983, 525.
17. Liebel, H., Johari, O., (eds.) Scanning Electron Microscopy II, 1985, SEM Inc., AMF O'Hare, Chicago, Illinois, 519.
18. Munro, E., Hawkes, P.W., (eds.) Image Processing and Computer Aided Design in Electron Optics, 1973, Academic Press, London, 284.
19. Munro, E., Orloff, J., Rutherford, R., Wallmark, J., J. Vac. Sci. Technol., B6, 1988, 1971.
20. Narum, D.H., Pease, R.F., J. Vac Sci. Technol., B4, 1986, 154.
21. Narum, D.H., Pease, R.F., J. Vac. Sci. Technol., B6, 1988, 966.
22. Ochiai, Y., Shihoyama, K., Shiokawa, T., Toyoda, K., Masayama, A., Gamo, K., Namba, S., J. Vac. Sci. Technol., B4, 1986, 333.
23. Orloff, J., J. Vac. Sci. Technol., B5, 1987, 175.
24. Orloff, J., Microelectronic Eng., 6, 1987, 327.
25. Orloff, J., Swanson, L.W., J. Appl. Phys., 50, 1979, 2494.
26. Orloff, J., Swanson, L.W., Scanning Electron Microscopy, 1, 1979, 39.
27. Orloff, J., Whitney, J., Proc. SPIE. Electron-Beam X-Ray, and Ion Beam Technology for Submicrometer Lithography, VII(923), 1988, 121.
28. Parker, N.W., Robinson, W.P., Levi-Setti, R., Wang, Y.L., Crow, G., Proc. SPIE. Electron-Beam, X-Ray and Ion-Beam Techniques for Submicrometer Lithography, IV(537), 1985, 117.
29. Saito, K., Okubo, T., Takamoto, K., J. Vac. Sci. Technol., A4, 1986, 226.
30. Scheinfein, M., Galantai, A., Optik, 74, 1986, 154.
31. Seliger, R.L., Kubena, R.L., Olney, R.D., Ward, J.W., Wang, V., J. Vac. Sci. Technol., 16, 1979, 1610.
32. Shao, Z., Rev. Sci. Instrum., 59, 1988, 1985.
33. Shao, Z., Crewe, A.V., Ultramicroscopy, 23, 1987, 169.
34. Shao, Z., Crewe, A.V., Optik, 79, 1988, 105.
35. Shao, Z., Wang, Y.L., J. Vac. Sci. Technol., B8, 1990, 95.
36. Shedd, G.M., Lezec, H., Dubney, A.D., Melngailis, J., Appl. Phys. Lett., 49, 1986, 1584.
37. Slowko, W., J. Vac. Sci. Technol., B1, 1981, 1137.
38. Smith, M.R., Munro, E., J. Vac. Sci. Technol., B5, 1987, 161.
39. Szilagyi, M., J. Vac. Sci. Technol., B1, 1983, 1137.
40. Szilagyi, M., Proc. IEEE, 73, 1985, 412.
41. Szilagyi, M., Appl. Phys. Lett., 44, 1986, 7.
42. Szilagyi, M., Szep, J., J. Vac. Sci. Technol., B6, 1988, 953.
43. Tsumagari, T., Ohiwa, H., Noda, T., J. Vac. Sci. Technol., B6, 1988, 949.
44. Wang, Y.L., Harriott, L.R., Hamm, R.A., Temkin, H., Appl. Phys. Lett., 56, 1990, 749.
45. Wu, X.D., Shao, Z., Optik, 84, 1990, 66.
46. Ximen, J., Optik, 80, 1988, 2.
47. Ximen, J., J. Appl. Phys., 67, 1990, 1643.
48. Yau, Y.W., Groves, T.R., Pease, R.F., J. Vac. Sci. Technol., B1, 1983, 1141.
49. Zworykin, V.K., Morton, G.A., Ramberg, E.G., Hillier, J., Vance, A.W., Electron Optics and Electron Microscope., 1945, Wiley, New York.