Bulk Metal Electrodeposition in the Sub-monolayer Regime: Ru on Pt(111)

Zeitschrift fur Physikalische Chemie

Volumn 208, Issue Part_1_2, 1999, Pages 137-150

  Friedrich, K A ^a   Geyzers, K P ^a   Marmanti, A ^a,b   Stimming, U ^a   Vogel, R ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON MONOXIDE; CHLORINE COMPOUNDS; ELECTROCATALYSIS; ELECTRODEPOSITION; ELECTRODES; ELECTROOXIDATION; MONOLAYERS; PLATINUM; SCANNING TUNNELING MICROSCOPY; SURFACE DIFFUSION;

CATALYTIC PROPERTIES; DEPOSITION POTENTIAL; ELECTROCATALYTIC PROPERTIES; ELECTROCHEMICAL INTERFACE; ELECTROCHEMICAL SCANNING TUNNELING MICROSCOPY; ELECTROCHEMICAL TECHNIQUES; POTENTIOSTATIC ELECTRODEPOSITION; PT(111);

RUTHENIUM;

EID: 0001498054     PISSN: 09429352     EISSN: None     Source Type: Journal    
DOI: 10.1524/zpch.1999.208.Part_1_2.137     Document Type: Article

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