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Volumn 37, Issue 9, 1988, Pages 4609-4617

Raman-scattering depth profile of the structure of ion-implanted GaAs

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001486051     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.37.4609     Document Type: Article
Times cited : (76)

References (30)
  • 3
    • 84927843506 scopus 로고    scopus 로고
    • W. M. Duncan and G. Westphal in VLSI Electronics: Micro- structure Science, edited by N. G. Einspruch and W. R. Wisseman (Academic, New York, 1985), p. 41.
  • 12
    • 84927843505 scopus 로고    scopus 로고
    • W. McLevige, Ph.D dissertation, University of Illinois, 1978, p. 17.
  • 20
    • 84927843504 scopus 로고    scopus 로고
    • Flash-evaporated amorphous GaAs films were provided by M-L. Theye, Université Pierre et Marie Curie, Paris;
  • 23
    • 84927843502 scopus 로고    scopus 로고
    • The etching process results in a slightly higher surface reflectance due possibly to oxide formation, or, more likely, to scratches and pitting. The damaged samples have a slightly higher reflectance (2–4^%).
  • 27
    • 84927843500 scopus 로고    scopus 로고
    • J. F. Ziegler, J. P. Biersack, and V. Littmark, The Stopping and Range of Ions in Solids, Ref. 2, p. 109.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.