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Journal of Applied Physics

Volumn 70, Issue 3, 1991, Pages 1416-1420

The thermal stability of SiGe films deposited by ultrahigh-vacuum chemical vapor deposition

(6) Stiffler, S R a Comfort, J H a Stanis, C L a Harame, D L a De Fresart E a Meyerson, B S a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001464737 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.349551 Document Type: Article

Times cited : (38)

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