Molecular dynamic model of the magnetic properties and microstructure of advanced metal particle dispersions

Journal of Applied Physics

Volumn 81, Issue 8 PART 2A, 1997, Pages 3818-3820

  Coverdale, G N ^a   Chantrell, R W ^a   Satoh, A ^b   Vietch, R ^c  

^a BANGOR UNIVERSITY   (United Kingdom)

^b CHIBA UNIVERSITY   (Japan)

^c BASF SE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001459859     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364780     Document Type: Article

References (4)

1. P. A. Deymier, C. Jung, and S. Raghavan, J. Appl. Phys. 75, 5571 (1994).
2. G. N. Coverdale, R. W. Chantrell, A. Hart, and D. Parker, J. Magn. Magn. Mater. 120, 210 (1993).
3. G. N. Coverdale, R. W. Chantrell, A. Hart, and D. Parker, J. Appl. Phys. 75, 5574 (1993).
4. J. J. Newman and R. B. Y. Yarbrough, IEEE Trans. Magn. MAG-5, 320 (1969).