Deposition and Crystallization of A-Si Low Pressure Chemically Vapor Deposited Films Obtained by Low-Temperature Pyrolysis of Disilane

Journal of the Electrochemical Society

Volumn 140, Issue 3, 1993, Pages 871-877

  Hatalis, Miltiadis K ^a  

^a LEHIGH UNIVERSITY   (United States)

Author keywords

amorphous state; chemical vapour deposition; nucleation; silicon alloys; thin films

Indexed keywords

EID: 0001450861     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2056177     Document Type: Article

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