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Volumn 67, Issue , 1995, Pages 2164-
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Increased uniformity and thermal stability of CoSi2 thin films by Ti capping
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001448053
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.114754 Document Type: Article |
Times cited : (49)
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References (0)
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