Stress relaxation and critical layer thickness of high-temperature superconductor thin films, heterostructures, and superlattices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2697, Issue , 1996, Pages 339-349

  Contour, Jean Pierre ^a   Abert, A ^a,b   Défossez, Arnaud ^c  

^a CNRS   (France)

^b UNIVERSITY OF KONSTANZ   (Germany)

^c PSL RESEARCH UNIVERSITY   (France)

Author keywords

Critical thickness; HTSC thin film; Strained epitaxial layer; Superlattice

Indexed keywords

COPPER COMPOUNDS; CRYSTAL GROWTH; CRYSTALS; ELECTRIC CONDUCTIVITY; EPITAXIAL FILMS; EPITAXIAL GROWTH; HETEROJUNCTION BIPOLAR TRANSISTORS; HETEROJUNCTIONS; HIGH TEMPERATURE SUPERCONDUCTORS; OPTICAL ENGINEERING; OXIDE SUPERCONDUCTORS; SEMICONDUCTOR GROWTH; SEMICONDUCTOR MATERIALS; SEMICONDUCTOR METAL BOUNDARIES; SEMICONDUCTOR SUPERLATTICES; SINGLE CRYSTALS; SOLIDS; SUPERCONDUCTING FILMS; SUPERCONDUCTING MATERIALS; SUPERCONDUCTIVITY; THIN FILM DEVICES; THIN FILMS;

CRITICAL LAYER THICKNESSES; CRITICAL THICKNESS; CUPRATE; ELASTIC STRAINS; HETEROEPITAXIAL GROWTHS; HETEROSTRUCTURES; HIGH TEMPERATURES; HTSC THIN FILM; SEMICONDUCTOR EPITAXIAL LAYERS; SEMICONDUCTOR EPITAXIES; SINGLE CRYSTAL SUBSTRATES; STRAINED EPITAXIAL LAYER; YBA-CU-O;

EPITAXIAL LAYERS;

EID: 0001435309     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.250242     Document Type: Conference Paper

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