Absorption and exposure in positive photoresist

Applied Optics

Volumn 27, Issue 23, 1988, Pages 4913-4919

  Mack, Chris A ^a  

^a ARMED FORCES INSTITUTE OF PATHOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001403531     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.27.004913     Document Type: Article

References (12)

1. D. A. Skoog and D. M. West, Fundamentals of Analytical Chemistry (Holt, Rinehart, & Winston, New York, 1976), pp. 509-510.
2. J. M. Koyler et al., “Thermal Properties of Positive Photoresist and Their Relationship to VLSI Processing,” in Proceedings, Kodak Microelectronic Interface’79 (Oct. 1979), pp. 150-165.
3. J. M. Shaw, M. A. Frisch, and F. H. Dill, “Thermal Analysis of Positive Photoresist Films by Mass Spectrometry,” IBM J. Res. Dev. 21, 219 (1977).
4. F. H. Dill et al., “Characterization of Positive Photoresist,” IEEE Trans. Electron Dev. ED-22, 445 (1975).
5. W. J. Moore, Physical Chemistry (Prenctice Hall, Englewood Cliffs, NJ, 1972), pp. 753-755.
6. G. Bachur, “Development of Optical Measurement and Control Systems for Photolithography,” Proc. Soc. Photo-Opt. Instrum. Eng. 80, 2 (1976).
7. A. Minvielle and R. Rice, “Spectral Output Variations in Per-kin-Elmer Micraligns,” in Proceedings, Kodak Microelectronic Interface’79 (Oct. 1979), pp. 60-65.
8. C. A. Mack, “Analytical Expression for the Standing Wave Intensity in Photoresist,” Appl. Opt. 25, 1958 (1986).
9. J. Albers and D. B. Novotny, “Intensity Dependence of Photochemical Reaction Rates for Photoresists,” J. Electrochem. Soc. 127, 1400, (1980).
10. C. A. Mack, “PROLITH: A Comprehensive Optical Lithography Model,” Proc. Soc. Photo-Opt. Instrum. Eng. 538, 207(1985).
11. Reichhold Chemicals, Inc., Warren, NJ 07060.
12. Fairmount Chemical Co., Inc., Newark, NJ 07105.