Extremely Low Contact Resistivity of Ti/Pt/Au Contacts on P+-Ingaas as Determined by a New Evaluation Method

Journal of the Electrochemical Society

Volumn 140, Issue 3, 1993, Pages 847-850

  Franz, Gerhard ^a   Amann, Markus Christian ^a  

^a Siemens Research Laboratories ^*  (Grenada)

Author keywords

diffusion; gallium compounds; indium compounds; scanning electron microscopes; titanium compounds

Indexed keywords

EID: 0001392162     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2056171     Document Type: Article

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