The Photolysis of Methoxy-Substituted Benzoin Esters. A Photosensitive Protecting Group for Carboxylic Acids

Journal of the American Chemical Society

Volumn 93, Issue 26, 1971, Pages 7222-7228

  Sheehan, John C ^a   Wilson, R Marshall ^a   Oxford, A W ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001383523     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja00755a017     Document Type: Article

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