Negative differential resistance at atomic contacts

Physical Review B - Condensed Matter and Materials Physics

Volumn 55, Issue 15, 1997, Pages 9364-9366

  Lang, N ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001380741     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.55.9364     Document Type: Article

References (18)

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15. This is taken to be 1.8 bohrs, measured between the center of the Br atom and the positive-background edge of the uniform-background (jellium) model representing each electrode. It is obtained by using the layer spacing for Br adsorbed on Cu(111) determined by M. F. Kadodwala, A. A. Davis, G. Scragg, B. C. C. Cowie, M. Kerkar, D. P. Woodruff and R. G. Jones, Surf. Sci. 324, 122 (1995), together with the fact that the positive-background edge of a jellium is half an interlayer spacing outside of the center of the outermost layer of the metal it represents (neglecting contractions or expansions of the layer spacing at the surface).
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