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Volumn 55, Issue 23, 1990, Pages 5919-5922

Base Catalysis in Imaging Materials. 1. Design and Synthesis of Novel Light-Sensitive Urethanes as Photoprecursors of Amines

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EID: 0001378387     PISSN: 00223263     EISSN: 15206904     Source Type: Journal    
DOI: 10.1021/jo00310a028     Document Type: Article
Times cited : (88)

References (37)
  • 7
    • 0002578796 scopus 로고
    • E., Reichmanis, S. A., MacDonald, T., Iwayanagi, Ed.; ACS Symposium Series 412; American Chemical Society: Washington DC
    • Houlihan, F. M.; Reichmanis, E.; Thompson, L. F.; Tarascon, R. G. In Polymers for Microlithography; E., Reichmanis, S. A., MacDonald, T., Iwayanagi, Ed.; ACS Symposium Series 412; American Chemical Society: Washington DC. 1989: Chanter 3. p 39.
    • (1989) Polymers for Microlithography , pp. 39
    • Houlihan, F.M.1    Reichmanis, E.2    Thompson, L.F.3    Tarascon, R.G.4
  • 21
    • 0002141044 scopus 로고
    • Adamson, A. W., Fleischauer, P. D. Eds.; Wiley-Interscience: New York
    • Endicott, J. F. In Concepts of Inorganic Photochemistry; Adamson, A. W., Fleischauer, P. D. Eds.; Wiley-Interscience: New York, 1975; p 81.
    • (1975) Concepts of Inorganic Photochemistry , pp. 81
    • Endicott, J.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.