Theoretical discussion of diffusion effects in negative chemically amplified resists based on contrast curve simulation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2561-2564

  Patsis, G P ^a   Meneghini, G ^b   Glezos, N ^a   Argitis, P ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^b CSELT   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001378355     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589685     Document Type: Article

References (15)

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