An apparatus for supersonic jet epitaxy of thin films

Review of Scientific Instruments

Volumn 71, Issue 3, 2000, Pages 1479-1487

  Ustin, S A ^a,b   Brown, K A ^a,c   Ho, W ^a  

^a Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

^b NOKIA RESEARCH CENTER   (United States)

^c KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001356980     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150484     Document Type: Article

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