Chemical sputtering of Si related to roughness formation of a Cl-passivated Si surface

Journal of Applied Physics

Volumn 74, Issue 2, 1993, Pages 1303-1309

  Feil, H ^a   Dieleman, J ^a   Garrison, B J ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001356058     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.354909     Document Type: Article

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