Very thin insulating layer formed by low-energy Ar-beam bombardment in the surface region of undoped hydrogenated amorphous silicon

Applied Physics Letters

Volumn 77, Issue 12, 2000, Pages 1783-1785

  Durny, R ^a   Pincik, E ^b   Nadazdy, V ^b   Jergel, M ^b   Shimizu, J ^c   Kumeda, M ^c   Shimizu, T ^c  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b INSTITUTE OF PHYSICS   (Slovakia)

^c KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001348168     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1310634     Document Type: Article

References (5)

1. V. Nadazdy, R. Durny, and E. Pincik, Phys. Rev. Lett. 78, 1102 (1997).
2. File No. 41-788 of the Powder Diffraction Database (PDF-2) of JCPDS -ICDD diffraction dala available from the International Center for Diffraction Data, Newtown Square, PA, www.icdd.com
3. D. L. Griscom, J. Non-Cryst. Solids 40, 211 (1980).
4. E. Holzenkampfer, F. W. Richter, J. Stuke, and U. Voget-Grote, J. Non-Cryst. Solids 32, 327 (1979).
5. H. Yan, A. Morimoto, M. Kumeda, T. Shimizu, and Y. Yonezawa, Mater. Res. Soc. Symp. Proc. 258, 247 (1992).