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Journal of Applied Physics

Volumn 72, Issue 10, 1992, Pages 4683-4695

Positive charge generation in SiO2 by electron-impact emission of trapped electrons

(2) Thompson, Scott E a Nishida, Toshikazu a

a UNIVERSITY OF FLORIDA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001323947 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.352074 Document Type: Article

Times cited : (32)

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