Explanation for the polarity dependence of breakdown in ultrathin silicon dioxide films

Applied Physics Letters

Volumn 68, Issue 21, 1996, Pages 3004-3006

  DiMaria, D J ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001320103     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116678     Document Type: Article

References (9)

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