Composition and growth kinetics of ultrathin SiO2 films formed by oxidizing Si substrates in N2O

Applied Physics Letters

Volumn 57, Issue 26, 1990, Pages 2808-2810

  Ting, W ^a   Hwang, H ^a   Lee, J ^a   Kwong, D L ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

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Indexed keywords

EID: 0001299440     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.104199     Document Type: Article

References (16)