Chemical activity of the CC double bond on silicon surfaces

Surface Science

Volumn 177, Issue 1, 1986, Pages

  Bozack, M J ^a   Taylor, P A ^a   Choyke, W J ^a   Yates Jr , J T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001297729     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(86)90252-9     Document Type: Article

References (6)

1. Dependence of residual damage on temperature during Ar+ sputter cleaning of silicon