A Novel Photorearrangement of a Cyclohexadiene Derivative of C60

Organic Letters

Volumn 4, Issue 7, 2002, Pages 1217-1219

  Iwamatsu, Sho Ichi ^a   Vijayalakshmi, Periya S ^a   Hamajima, Masanori ^a   Suresh, Cherumuttathu H ^a   Koga, Nobuaki ^a   Suzuki, Toshiyasu ^b   Murata, Shizuaki ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE;

EID: 0001296985     PISSN: 15237060     EISSN: None     Source Type: Journal    
DOI: 10.1021/ol025678t     Document Type: Article

References (31)

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27. Pure 4a was isolated in 1% yield after complete oxidation of 3a (ref 8b), and fully characterized by NMR, IR, UV/vis, MS, and elemental analysis (see Supporting Information).
28. 6 are follows: 1b, 64.97; 3b, 58.55; 4b, 67.63, 54.08, and 45.72 ppm (Supporting Information).
29. Further structural confirmation by INADEQUATE (Incredible Natural Abundance Double Quantum Experiment) NMR spectrum has not resulted in success at present because of their stability.
30. Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Zakrzewski, V. G.; Montgomery, J. A., Jr.; Stratmann, R. E.; Burant, J. C.; Dapprich, S.; Millam, J. M.; Daniels, A. D.; Kudin, K. N.; Strain, M. C.; Farkas, O.; Tomasi, J.; Barone, V.; Cossi, M.; Cammi, R.; Mennucci, B.; Pomelli, C.; Adamo, C.; Clifford, S.; Ochterski, J.; Petersson, G. A.; Ayala, P. Y.; Cui, Q.; Morokuma, K.; Malick, D. K.; Rabuck, A. D.; Raghavachari, K.; Foresman, J. B.; Cioslowski, J.; Ortiz, J. V.; Stefanov, B. B.; Liu, G.; Liashenko, A.; Piskorz, P.; Komaromi, I.; Gomperts, R.; Martin, R. L.; Fox, D. J.; Keith, T.; Al-Laham, M. A.; Peng, C. Y.; Nanayakkara, A.; Gonzalez, C.; Challacombe, M.; Gill, P. M. W.; Johnson, B.; Chen, W.; Wong, M. W.; Andres, J. L.; Gonzalez, C.; Head-Gordon, M.; Replogle, E. S.; and Pople, J. A. Gaussian 98, rev. A.9; Gaussian, Inc.: Pittsburgh, PA, 1998.
31. AMI calculations were performed by using a Hyperchem 6 molecular modeling system.