Experimental investigation and fast two-dimensional self-consistent kinetic modeling of a low-pressure inductively coupled rf discharge

Physical Review E

Volumn 51, Issue 6, 1995, Pages 6063-6078

  Kortshagen, U ^a,b   Pukropski, I ^a,b   Tsendin, L D ^a,b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001291508     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.51.6063     Document Type: Article

References (83)

1. Characteristics of electron cyclotron resonance plasma sources
2. Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
3. Novel radio-frequency induction plasma processing techniques
4. Transformer coupled plasma etch technology for the fabrication of subhalf micron structures
5. Gate oxide damage in a high density inductively coupled plasma
6. Two-dimensional fluid model of high density inductively coupled plasma sources
7. On the characterization of a RF parallel plate discharge
8. The influence of the plasma resonance heating on the maintenance of surface wave produced discharges
9. Effects of electron-electron collisions on the characteristics of DC and microwave discharges in argon at low pressures
10. On the influence of excited atoms on the electron kinetics of a surface wave sustained argon plasma