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Volumn 34, Issue 10, 1998, Pages 1053-1056

Structure of Silicon Nitride Layers Grown by Plasma-Enhanced Chemical Vapor Deposition

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EID: 0001284044     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (15)
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  • 4
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  • 7
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    • (1989) J. Vac. Sci. Technol., A , vol.7 , Issue.3 , pp. 1446
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  • 8
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  • 9
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  • 13
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.