Anomalous diffusion of arsenic in silicon during low-temperature heat treatment

Applied Physics Letters

Volumn 27, Issue 4, 1975, Pages 230-231

  Shibayama, H ^a   Masaki, H ^a   Hashimoto, H ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001278865     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.88439     Document Type: Article

References (4)